Plasma Chemistry and Plasma Processing

eISSN: 1572-8986pISSN: 0272-4324

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Key Metrics

CiteScore
5.4
H-Index
72
Impact Factor
< 5
SJR
Q2Condensed Matter Physics
SNIP
1.12
3
Time to Publish
time-to-publish View Chart
4  Mo

Journal Specifications

Indexed in the following public directories

  • Web of Science Web of Science
  • Scopus Scopus
  • Inspec Inspec
  • SJR SJR
Overview
  • Publisher
    SPRINGER
  • Language
    English
  • Frequency
    Bi-monthly
General Details
View less
Time to Publish
Time to publish distribution
Articles published in year 2022
Time to publish index
Months% Papers published
0-3 28%
4-6 53%
7-9 18%
>9 1%

Topics Covered

Plasma jet
Dielectric barrier discharge
Reactive oxygen species
Plasma reactor
Human melanoma
Glow discharge
Plasma treatment
Germination
Atmospheric pressure
Toluene
O2 plasma
Information engineering
Argon
Electric field
Electrostatic discharge
Glow discharge plasma
Seed treatment
Bond strength
Antibacterial efficacy
Electric arc

Recently Published Papers

FAQs

Since when has Plasma Chemistry and Plasma Processing been publishing? Faqs

The Plasma Chemistry and Plasma Processing has been publishing since 1981 till date.

How frequently is the Plasma Chemistry and Plasma Processing published? Faqs

Plasma Chemistry and Plasma Processing is published Bi-monthly.

What is the H-index. SNIP score, Citescore and SJR of Plasma Chemistry and Plasma Processing? Faqs

Plasma Chemistry and Plasma Processing has a H-index score of 72, Citescore of 5.4, SNIP score of 1.12, & SJR of Q2

Who is the publisher of Plasma Chemistry and Plasma Processing? Faqs

The publisher of Plasma Chemistry and Plasma Processing is SPRINGER.

How can I view the journal metrics of Plasma Chemistry and Plasma Processing on editage? Faqs

For the Plasma Chemistry and Plasma Processing metrics, please refer to the section above on the page.

What is the eISSN and pISSN number of Plasma Chemistry and Plasma Processing? Faqs

The eISSN number is 1572-8986 and pISSN number is 0272-4324 for Plasma Chemistry and Plasma Processing.

What is the focus of this journal? Faqs

The journal covers a wide range of topics inlcuding Plasma jet, Dielectric barrier discharge, Reactive oxygen species, Plasma reactor, Human melanoma, Glow discharge, Plasma treatment, Germination, Atmospheric pressure, Toluene, O2 plasma, Information engineering, Argon, Electric field, Electrostatic discharge, Glow discharge plasma, Seed treatment, Bond strength, Antibacterial efficacy, Electric arc.

Why is it important to find the right journal for my research? Faqs

Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.

Can the choice of journal affect my academic career? Faqs

Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.

Is it advisable to target high-impact journals only? Faqs

While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.