Plasma Sources Science and Technology
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Aims and Scope
Plasma Sources Science and Technology is an international journal dedicated solely to non-fusion aspects of plasma science. The Journal was founded in 1992 by Professor Noah Hershkowitz of the University of Wisconsin–Madison who also served as Editor-in-Chief until 2007. Mark J. Kushner of the Michigan Institute for Plasma Science and Engineering, University of Michigan took over the leadership of the journal until 2013 when Professor Bill Graham, Queen's University Belfast, became Editor-in-Chief. Professor Graham was followed by Professor Uwe Czarnetzki, Ruhr University Bochum, who became Editor-in-Chief in 2017. Professor Czarnetzki is actively involved in the peer-review of every paper. Less
Key Metrics
View Chart Journal Specifications
- PublisherIOP PUBLISHING LTD
- LanguageEnglish
- FrequencyBi-monthly
- LanguageEnglish
- FrequencyBi-monthly
- Publication Start Year1992
- Publisher URL
- Website URL
| Months | % Papers published |
|---|---|
| 0-3 | 12% |
| 4-6 | 53% |
| 7-9 | 24% |
| >9 | 12% |
Topics Covered
Year-wise Publication
- 5Y
- 10Y
FAQs
Since when has Plasma Sources Science and Technology been publishing? 
The Plasma Sources Science and Technology has been publishing since 1992 till date.
How frequently is the Plasma Sources Science and Technology published?
Plasma Sources Science and Technology is published Bi-monthly.
Who is the publisher of Plasma Sources Science and Technology?
The publisher of Plasma Sources Science and Technology is IOP PUBLISHING LTD.
Where can I find a journal's aims and scope of Plasma Sources Science and Technology?
For the Plasma Sources Science and Technology's Aims and Scope, please refer to the section above on the page.
How can I view the journal metrics of Plasma Sources Science and Technology on editage?
For the Plasma Sources Science and Technology metrics, please refer to the section above on the page.
What is the eISSN and pISSN number of Plasma Sources Science and Technology?
The eISSN number is 1361-6595 and pISSN number is 0963-0252 for Plasma Sources Science and Technology.
What is the focus of this journal?
The journal covers a wide range of topics inlcuding Plasma jet, Argon, Ion energy, Electron density, Dielectric barrier discharge, Distribution function, Amplitude, Simulation, Frequency, Atmospheric pressure, External circuit, Power absorption, Plasma density, Electric field, Joule heating, Infrared, Tantalum, Electron temperature, Voltage pulse, Boltzmann equation.
Why is it important to find the right journal for my research?
Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.
Can the choice of journal affect my academic career?
Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.
Is it advisable to target high-impact journals only?
While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.