Key Metrics
Journal Specifications
Indexed in the following public directories
Web of Science
Scopus
Inspec
SJR
- PublisherSPRINGER
- LanguageEnglish
- FrequencyBi-monthly
- LanguageEnglish
- FrequencyBi-monthly
- Publication Start Year2006
- Publisher URL
- Website URL
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Months | % Papers published |
---|---|
0-3 | 91% |
4-6 | 8% |
7-9 | 1% |
>9 | 0% |
Topics Covered
Year-wise Publication
- 5Y
- 10Y
FAQs
Since when has Plasmonics been publishing? 
The Plasmonics has been publishing since 2006 till date.
How frequently is the Plasmonics published? 
Plasmonics is published Bi-monthly.
Who is the publisher of Plasmonics? 
The publisher of Plasmonics is SPRINGER.
How can I view the journal metrics of Plasmonics on editage? 
For the Plasmonics metrics, please refer to the section above on the page.
What is the eISSN and pISSN number of Plasmonics? 
The eISSN number is 1557-1963 and pISSN number is 1557-1955 for Plasmonics.
What is the focus of this journal? 
The journal covers a wide range of topics inlcuding Metamaterial, Simulation, Surface plasmon, Plasmonic nanostructures, Monolayer, Resonator, Boron nitride, Localized surface plasmon, Broadband, Particle size, Fiber optic sensor, Photoconductive antenna, Photonic crystal, Refractive index, Indium tin oxide, Figure of merit, Fano resonance, Plasmonic nanoparticles, Biosensor, Reflection coefficient.
Why is it important to find the right journal for my research? 
Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.
Can the choice of journal affect my academic career? 
Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.
Is it advisable to target high-impact journals only? 
While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.